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Structural Characterization of a Manganese Oxide Barrier Layer Formed by Chemical Vapor Deposition for Advanced Interconnects Application on SiOC Dielectric Substrates
Friday, December 28, 2012 19:52
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Nguyen Mai Phuong, Yuji Sutou and Junichi Koike
The Journal of Physical Chemistry C
DOI: 10.1021/jp303241c
2012-12-28 19:47:24
Source: http://nanochemistry.blogspot.com/2012/12/structural-characterization-of.html
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