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Three-Dimensional Etching of Silicon for the Fabrication of Low-Dimensional and Suspended Devices
Saturday, December 15, 2012 14:43
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Where size matters
Axel Scherer
Nanoscale , 2012, Accepted Manuscript
DOI: 10.1039/C2NR32981F, Communication
Sameer S Walavalkar, Andrew P. Homyk, M. David Henry, Axel Scherer
In order to expand the use of nanoscaled silicon structures we present a new etching method that allows us to shape silicon with sub-10 nm precision. This top-down, CMOS compatible…
The content of this RSS Feed (c) The Royal Society of Chemistry
2012-12-15 14:30:08
Source: http://nanochemistry.blogspot.com/2012/12/three-dimensional-etching-of-silicon.html
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