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Graphene as an atomically thin barrier to Cu diffusion into Si
Monday, June 2, 2014 4:51
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Nanoscale , 2014, Advance Article
DOI: 10.1039/C3NR06771H, Paper
Juree Hong, Sanggeun Lee, Seulah Lee, Heetak Han, Chandreswar Mahata, Han-Wool Yeon, Bonwoong Koo, Seong-Il Kim, Taewook Nam, Kisik Byun, Byung-Wook Min, Young-Woon Kim, Hyungjun Kim, Young-Chang Joo, Taeyoon Lee
We investigate the ability of both single-layer and multilayer graphene grown by chemical vapor deposition (CVD) to act as Cu diffusion barriers.
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