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Large-scale freestanding nanometer-thick graphite pellicle for mass production of nanodevices beyond 10 nm
Monday, June 29, 2015 4:50
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Where size matters
Nanoscale, 2015, Accepted Manuscript
DOI: 10.1039/C5NR03079J, Communication
DOI: 10.1039/C5NR03079J, Communication
Ji-Beom Yoo, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, Changgu Lee, Cheol Woong Yang, Sungjoo Lee, Sang Jin Cho, Hwan Chul Jeon, Mun Ja Kim, Byung-Gook Kim
Extreme ultraviolet lithography (EUVL) has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10 nm. We present a new pellicle material, nanometer-thick…
The content of this RSS Feed (c) The Royal Society of Chemistry
Extreme ultraviolet lithography (EUVL) has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10 nm. We present a new pellicle material, nanometer-thick…
The content of this RSS Feed (c) The Royal Society of Chemistry
Source: http://nanochemistry.blogspot.com/2015/06/large-scale-freestanding-nanometer.html
