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Layered nano-gratings by electron beam writing to form 3-level diffractive optical elements for 3D phase-offset holographic lithography
Monday, November 16, 2015 4:50
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Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR06822C, Communication
DOI: 10.1039/C5NR06822C, Communication
Liang (Leon) Yuan, Peter R. Herman
Three-level nano-grating phase masks fabricated by e-beam lithography provided a diamond-like symmetry in holographic exposure and promised 3D complete stopbands.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
Three-level nano-grating phase masks fabricated by e-beam lithography provided a diamond-like symmetry in holographic exposure and promised 3D complete stopbands.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
Source: http://nanochemistry.blogspot.com/2015/11/layered-nano-gratings-by-electron-beam_16.html
