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Substrate Tolerant Direct Block Copolymer Nanolithography
Friday, November 13, 2015 2:43
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Where size matters
Nanoscale, 2015, Accepted Manuscript
DOI: 10.1039/C5NR06815K, Communication
DOI: 10.1039/C5NR06815K, Communication
Tao Li, Zhongli Wang, Lars Schulte, Sokol Ndoni
Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate…
The content of this RSS Feed (c) The Royal Society of Chemistry
Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate…
The content of this RSS Feed (c) The Royal Society of Chemistry
Source: http://nanochemistry.blogspot.com/2015/11/substrate-tolerant-direct-block.html
