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Atomic Layer Deposition of Al2O3 onto Sn-Doped In2O3: Absence of Self-Limited Adsorption during Initial Growth by Oxygen Diffusion from the Substrate and Band Offset Modification by Fermi Level Pinning in Al2O3
Friday, November 30, 2012 16:31
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Thorsten J.M. Bayer, André Wachau, Anne Fuchs, Jonas Deuermeier and Andreas Klein
Chemistry of Materials
DOI: 10.1021/cm301732t
2012-11-30 15:21:39
Source: http://nanochemistry.blogspot.com/2012/11/atomic-layer-deposition-of-al2o3-onto.html
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