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Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition
Friday, May 3, 2013 13:34
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Anthoula C. Papageorgiou, Sybille Fischer, Seung Cheol Oh, Özge Sağlam, Joachim Reichert, Alissa Wiengarten, Knud Seufert, Saranyan Vijayaraghavan, David Écija, Willi Auwärter, Francesco Allegretti, Robert G. Acres, Kevin C. Prince, Katharina Diller, Florian Klappenberger and Johannes V. Barth
2013-05-03 13:16:54
Source: http://nanochemistry.blogspot.com/2013/05/self-terminating-protocol-for.html
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