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Thermodynamic mechanism of nickel silicide nanowire growth
Monday, December 3, 2012 17:22
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Where size matters
(author unknown)
Joondong Kim
A unique growth mechanism of nickel silicide (NiSi) nanowires (NWs) was thermodynamically investigated. The reaction between Ni and Si primarily determines NiSi phases according to the deposition condition. Optimum growth conditions were found at 375 °C leading long and high-density NiSi NWs. The … [Appl. Phys. Lett. 101, 233103 (2012)] published Mon Dec 03, 2012.
2012-12-03 17:03:22
Source: http://nanochemistry.blogspot.com/2012/12/thermodynamic-mechanism-of-nickel.html
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